表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
論文
Si(001)表面に対するRHEED入射電子波動場
堀尾 吉已高桑 雄二小川 修一
著者情報
ジャーナル フリー

2013 年 34 巻 7 号 p. 334-339

詳細
抄録

Auger electron intensity of Si-LVV from Si(001) 2×1 surface has been measured at room temperature (RT) for while changing the glancing angle of incident electron beam of RHEED. Such beam-rocking Auger electron spectroscopy (BRAES) profile shows intensity anomalies at surface wave resonance (SWR) conditions. Surface structure of Si(001) 2×1 has been analyzed by rocking curves of diffraction spots within the 0-th Laue zone. Because, RHEED intensities limited to the 0-th Laue zone can be determined by the projected potential of the Si atomic rows along the incident azimuth and then the phase of asymmetric dimers with flip-flop motion can be neglected. According to the Si(001) 2×1 surface structure model confirmed by the rocking curve analysis, it has been found that the calculated wave-field intensity profile on Si atoms reveals the similar intensity anomalies to those of experimental BRAES profile.

Fullsize Image
著者関連情報

この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
前の記事 次の記事
feedback
Top