表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集:X線吸収分光法の最前線
XAFS測定の最前線—軽薄短小の30年と次世代光源への期待
朝倉 清高上村 洋平
著者情報
キーワード: XAFS, XFEL, ERL, time-resoled
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2014 年 35 巻 3 号 p. 128-134

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XAFS (X-ray absorption Fine Structure) was available in the advents of synchrotron radiation (SR) and short range order theory. In 1982, Photon Factory starts in Japan and since then XAFS has been our daily tool for surface analysis. The Frontier of surface science is nanoscience and nanotechnology. XAFS has been developed to be an appropriate technique for the investigation of nanomaterials which require the applicability of XAFS to light, thin, short and small targets. We review the recent development in XAFS in these key words “light, thin, short and small”. We also discuss the future of XAFS in stand point of new light sources, XFEL and ERL. However both of them are a bit different from SR but complementary ones. These new light sources will make it possible to open a new horizon in XAFS in surface science.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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