2012 年 78 巻 790 号 p. 2302-2311
The composite abrasives have been developed for improving dispersibility and cleanability of conventional abrasives which are cerium oxide for glass polishing. The composite abrasives consist of polymer particles as mother particles and abrasives as child particles. Child particles are attached to the surface of mother particles by mechanical force. In this study, the effects of stagnation of abrasives on the polishing characteristics are investigated through some experiments. First, polymer particles that include silica particles and polymer particles that have nonspherical shape are employed. When using nonspherical particles, removal rate of polishing using composite abrasives is 50 % higher than that of conventional polishing. Second, the effects of polishing conditions on the polishing characteristics are investigated. Finally, WO3 particles are added into slurries of composite abrasives after classification. As a result, polishing characteristics of composite abrasives after classification were increased because stagnation of composite abrasives was improved.