Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Ion Beam Patterning of Block Copolymer Thin Films
Ranulfo AllenJohn BaglinOun-Ho ParkHo-Cheol Kim
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2009 Volume 22 Issue 6 Pages 755-760

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Abstract

Hierarchical nanostructures are generated on substrates by combining a top-down ion beam lithography with a bottom-up self-assembly of block copolymers. The ion beam lithography images micron sized patterns of block copolymer thin films which contain nanometer sized microdomains. This approach provides a simple route to fabricate structures containing two different length scales, i.e. micrometers and nanometers, which may find a variety of potential applications in nanoscience and technology.

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© 2009 The Society of Photopolymer Science and Technology (SPST)
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